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Control of Glass Texture by NaOH and HF Etching in Aluminium Induced Texturing Process for Enhanced Light Scattering in Silicon Thin Film Solar Cells
A. Soman, A. Antony
Light Trapping, Thin Film Solar Cell, Photovoltaic (PV), Aluminium Induced Texturing (AIT), Glass texture
Subtopic: Silicon-based Thin Film Solar Cells
Event: 29th European Photovoltaic Solar Energy Conference and Exhibition
Session: 3DV.4.42
1963 - 1966
ISBN: 3-936338-34-5
Paper DOI: 10.4229/EUPVSEC20142014-3DV.4.42
0,00 EUR
Document(s): paper


Textured glass substrates coated with transparent conducting oxide provides two textured interfaces for the light scattering into the thin film silicon solar cells, which will result in enhanced light trapping. Aluminium induced texturing of glass has been used to creat textured glasses and this work focuses at the etching method by using alkaline etchants like NaOH; thus reducing the complexity and cost of texturization by avoiding high temperature etching with ortho phosphoric acid or corrosive acids like HF. Alkaline etching results in a surface morphology of interconnected U-shaped micron range smooth and concave craters. Alkaline etching followed by a fast dip in 2% HF develops nanometric texture within the U shaped craters. The haze value at 600nm was found to decrease with decrease in thickness of Al and can be tuned from 8% to 40% by changing the process parameters. FTO coated textured glass shows a haze of 36%. The properties of these U shaped textured glasses are compared with that of commercially available Asahi U glass substrates.