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Title:
 
Double Printing Feasibility of 35um Printed Ag Finger Width
 
Author(s):
 
A. Voltan, E. Bortoletto, M. Zamuner, M. Martire, M. Bertazzo, M. Galiazzo
 
Keywords:
 
c-Si, Screen Printing, Metallization, Metallisation
 
Topic:
 
WAFER-BASED SILICON SOLAR CELLS AND MATERIALS TECHNOLOGY
Subtopic: Silicon Solar Cell Improvements
Event: 29th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2CV.4.40
 
Pages:
 
1387 - 1391
ISBN: 3-936338-34-5
Paper DOI: 10.4229/EUPVSEC20142014-2CV.4.40
 
Price:
 
 
0,00 EUR
 
Document(s): paper
 

Abstract/Summary:


In this paper we present the latest Double Printing results achieved at laboratory scale using Esatto Technologyâ„¢ and qualified consumables. Based on our laboratory roadmap, a printed finger width of 36um was obtained by implementation of Ultra Fine Line Double Printing with an overall 0.26% efficiency gain compared to an aggressive Single Printing. These significant improvements were achieved as result of dedicated tests and studies involving i) paste rheology analysis, ii) electrical simulation and modelling, and iii) optimization of screens, pastes and printing parameters. Furthermore, the concept of effective optical width is introduced to explain and demonstrate advantages of DP cells at module level compared to Single Printing.