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Title:
 
High Efficiency High Rate Microcrystalline Silicon Thin Film Solar Cells
 
Author(s):
 
C. Strobel, S. Leszczynski, U. Merkel, J. Kuske, D.D. Fischer, M. Albert, J.W. Bartha
 
Keywords:
 
PECVD, Solar Cell, High Rate, Microcrystalline Silicon, Very High Frequency
 
Topic:
 
THIN FILM SOLAR CELLS AND MODULES
Subtopic: Silicon-based Thin Film and Silicon-Heterojunction Solar Cells and Modules
Event: 31st European Photovoltaic Solar Energy Conference and Exhibition
Session: 3BO.5.2
 
Pages:
 
1019 - 1021
ISBN: 3-936338-39-6
Paper DOI: 10.4229/EUPVSEC20152015-3BO.5.2
 
Price:
 
 
0,00 EUR
 
Document(s): paper, presentation
 

Abstract/Summary:


In this work a highly productive deposition process for microcrystalline silicon thin-film solar cells is described. Therefore an outstanding high plasma excitation frequency of 140 MHz was used. A high efficiency of 9.6 % was achieved at 1.0 nm/s absorber layer deposition rate (8.6 % at 2.5 nm/s). In a first step the cell fabrication took place at a small scale electrode but later on the results can be transferred to a dynamic deposition system using linear VHF plasma sources. The concept of linear VHF plasma sources is also supported by plasma simulations using COMSOL multiphysics. This work summarizes the results achieved by TU-Dresden in work package 4 of the European project FAST TRACK.