Title:	High-Resolution THz Imaging for Optimized polySi Patterning Process
Author(s):	A. Mewe, M. Stodolny, P. Manshanden, A. Gutjahr, I. Cesar, J. Löffler
Keywords:	Passivation, Screen Printing, Characterisation, Characterization
Topic:	Silicon Materials and Cells
Subtopic:	Homojunction Solar Cells
Event:	36th European Photovoltaic Solar Energy Conference and Exhibition
Session:	2BO.4.3
Pages:	201 - 204
ISBN:	3-936338-60-4
Paper DOI:	10.4229/EUPVSEC20192019-2BO.4.3
Price:	0,00 EUR
Document(s):	paper

Abstract/Summary:

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We present new ways to characterize, analyze and improve the patterning process of doped polysilicon (polySi) for application as passivating contacts for 6’’ high-efficiency bifacial cells and interdigitated back contact (IBC) cells. Combined with standard characterization techniques, non-destructive sheet resistance mapping with ultrahigh resolution using THz imaging allows us to understand p+polySi patterning issues. We propose a reliable, high-quality patterning process that provides firing-stable surface passivation. Such passivation levels are suitable for application in several high-efficiency cell concepts, including IBC cells with polySi passivating contacts.