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Title:
 
High-Resolution THz Imaging for Optimized polySi Patterning Process
 
Author(s):
 
A. Mewe, M. Stodolny, P. Manshanden, A. Gutjahr, I. Cesar, J. Löffler
 
Keywords:
 
Passivation, Screen Printing, Characterisation, Characterization
 
Topic:
 
Silicon Materials and Cells
Subtopic: Homojunction Solar Cells
Event: 36th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2BO.4.3
 
Pages:
 
201 - 204
ISBN: 3-936338-60-4
Paper DOI: 10.4229/EUPVSEC20192019-2BO.4.3
 
Price:
 
 
0,00 EUR
 
Document(s): paper
 

Abstract/Summary:


We present new ways to characterize, analyze and improve the patterning process of doped polysilicon (polySi) for application as passivating contacts for 6’’ high-efficiency bifacial cells and interdigitated back contact (IBC) cells. Combined with standard characterization techniques, non-destructive sheet resistance mapping with ultrahigh resolution using THz imaging allows us to understand p+polySi patterning issues. We propose a reliable, high-quality patterning process that provides firing-stable surface passivation. Such passivation levels are suitable for application in several high-efficiency cell concepts, including IBC cells with polySi passivating contacts.