Title:	Key Aspects on Depostion of TCO Material for Heterojunction Solar Cells
Author(s):	G. Xiong, X.-S. Wang, L. Zhang
Keywords:	Deposition, Sputtering, TCO
Topic:	WAFER-BASED SILICON SOLAR CELLS AND MATERIALS TECHNOLOGY
Subtopic:	Silicon Solar Cell Improvements
Event:	28th European Photovoltaic Solar Energy Conference and Exhibition
Session:	2BV.1.9
Pages:	1061 - 1063
ISBN:	3-936338-33-7
Paper DOI:	10.4229/28thEUPVSEC2013-2BV.1.9
Price:	0,00 EUR
Document(s):	paper, poster

Abstract/Summary:

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We study and compare the performance of two different transparent conducting oxide (TCO) materials for heterojunction solar cells application. Thin layers of Al-doped Zinc Oxide, Indium Tin Oxide, and other material doped Indium Oxide are deposited on top of the emitter as a conductive layer to collect photo-generated current. RFmagnetron sputtering and Reactive Plasma Deposition (RPD) method are utilized for TCO depositions. We demonstrate that different method, deposition temperature, processing pressure and sputtering power will remarkably affect the characterization of TCO layers, such as the transmittance and resistivity, so as to definitively affect the efficiency of heterojunction solar cells. We also investigate other factors that may possibly affect TCO layers’ characteristics or conversion efficiency.