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Optimization of Rear Pattern for p-Type Mono Bifacial PERC Cells in Mass Production
H. Li, M. Ma, X. Yu, W. Yang, Q. Ma, Y. Wang
Aluminium Paste, Bifaciality, Bifacial PERC, Rear Pattern
Silicon Cells
Subtopic: Manufacturing & Production of Si Cells
Event: 35th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2DV.3.45
775 - 777
ISBN: 3-936338-50-7
Paper DOI: 10.4229/35thEUPVSEC20182018-2DV.3.45
0,00 EUR
Document(s): paper, poster


In this work, key factors effect the output power were studied to improve the electrical performance and bifaciality of Bi-PERC cells which were fabricated with thickness of 180um and a bulk resistivity ranging from 0.5Ωcm to 1.5Ωcm. Different aluminum paste, weight of aluminum paste, width of finger and the pitch of rear pattern were investigated in this paper. Under industrial mass production condition, it is shown that bifaciality of ptype mono PERC cells is no more than 70%. Moreover, after optimization, usage of aluminum paste reduced from 0.95g to 0.25g, it means 73.7% paste has been saved. And when printed width of aluminum finger is 150um, the pitch of rear pattern is 1.1mm, bifaciality can reached to 72.95%. Most probably, lower and moderate aluminum paste, narrower aluminum finger and wider pitch are the reasons for the higher bifaciality.