Title:	Next Generation Highly Versatile Industrial TCO Equipment
Author(s):	D. Zimin, R. Albert, O. Caglar, M. Clauss, S. Goldbach-Aschemann, D. Hüttner, P. Kuhn, P. Losio, M. Poppeller, M. Stecher, H. Booth
Keywords:	Transparent Conducting Oxides (TCO), Thin Film (TF), Zinc Oxide (ZnO)
Topic:	Thin Film Solar Cells
Subtopic:	Amorphous and Microcrystalline Silicon Solar Cells
Event:	27th European Photovoltaic Solar Energy Conference and Exhibition
Session:	3DV.1.34
Pages:	2548 - 2551
ISBN:	3-936338-28-0
Paper DOI:	10.4229/27thEUPVSEC2012-3DV.1.34
Price:	0,00 EUR
Document(s):	paper

Abstract/Summary:

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Boron doped zinc oxide deposited by Low Pressure Chemical Vapor Deposition (LPCVD) is used as cost efficient front and back contact in thin film solar applications. The ZnO layers deposited by LPCVD allow very good light trapping by their as-grown hazy optical properties. The hazier the front and back contact layers are the more current (Isc) is generated in the cell. Nevertheless this gain in current comes with the price of reduced Voc. The reduced voltage in the cell may be originating from steep valleys and sharp peaks in the highly developed ZnO morphology. Within this work possible solutions to modify LPCVD TCO surface morphology are described in order to gain cell voltage on the rough ZnO surfaces. Examples of morphologies that may by favorable for the Voc are given. Surface analysis is applied. A proposal is presented on how to attain these morphologies by simply changing the recipe during the deposition process. An industrial LPCVD TCO deposition tool is presented which allows the deposition of complex multilayer structures which are necessary to form advanced TCO layers.