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Full-Wafer Roller-NIL Processes for Silicon Solar Cell Texturisation
H. Hauser, B. Michl, C. Walk, J. Eisenlohr, J. Benick, A. Mellor, C. Müller, M. Hermle, B. Bläsi
Light Trapping, Texturisation, Texturization, Nanoimprint Lithography
Wafer-Based Silicon Solar Cells and Materials Technology
Subtopic: Silicon Solar Cell Improvements
Event: 27th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2CV.6.59
1968 - 1973
ISBN: 3-936338-28-0
Paper DOI: 10.4229/27thEUPVSEC2012-2CV.6.59
0,00 EUR
Document(s): paper


The highest solar cell efficiencies both for c-Si and mc-Si were reached using template based texturing processes. Especially for mc-Si the benefit of a defined texture, the so called honeycomb texture, was demonstrated impressively. However, up until now, no industrially feasible process has been available to pattern the necessary etching masks with the sufficient resolution. Roller-Nanoimprint Lithography (Roller-NIL) has the potential to overcome these limitations and to allow high quality pattern transfers, even in the sub-micron regime, in continuous in-line processes. Therefore, this etch-mask patterning technique is a suitable solution to bring such elaborate features like the honeycomb texture to an industrial realization. Beyond that, this fast printing-like technology opens up new possibilities to introduce promising concepts like photonic structures into solar cells.