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Title:
 
Large-Area Honeycomb Texturing of Si-Solar Cells via Nanoimprint Lithography
 
Author(s):
 
N. Tucher, A. Volk, J. Seiffe, H. Hauser, C. Müller, B. Bläsi
 
Keywords:
 
Texturisation, Texturization, Multicrystalline Silicon, Nanoimprint Lithography, Solar Cell Efficiency
 
Topic:
 
WAFER-BASED SILICON SOLAR CELLS AND MATERIALS TECHNOLOGY
Subtopic: Silicon Solar Cell Improvements
Event: 29th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2AV.3.16
 
Pages:
 
1006 - 1011
ISBN: 3-936338-34-5
Paper DOI: 10.4229/EUPVSEC20142014-2AV.3.16
 
Price:
 
 
0,00 EUR
 
Document(s): paper, poster
 

Abstract/Summary:


The highest solar cell efficiencies on mc-Si were realized using photolithographically defined texturing processes. The feasibility of fabricating honeycomb textures using Nanoimprint Lithography (NIL) was already demonstrated and excellent short-circuit current densities of up to 40.7 mA/cm² were achieved on small-area monocrystalline silicon (c-Si) solar cells. In the present work, large-area honeycomb texturing of multicrystalline silicon (mc-Si) substrates based on Roller-NIL and in-line-capable multi-wafer plasma etching using a modified Roth&Rau SiNA system is demonstrated. The realized honeycomb texture shows superior optical properties compared to isotextured mc-Si reference samples and even random pyramids on c-Si substrates, while surface passivation is comparably good. The fabricated 156 x 156 mm² mc-Si solar cells with Al-BSF show an efficiency of 17.8% compared to 17.3% of the isotextured reference. As VOC remains constant for both textures, the efficiency gain of 0.5% absolute results from a Jsc increase of up to 1.3 mA/cm2 (on cut 50 x 50 mm² cells even 2.5 mA/cm2), which confirms the superior optical quality of the honeycomb texture.