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Title:
 
High Quality SnO2:F Produced by Moving Belt APCVD
 
Author(s):
 
J. van Deelen, F. Grob, K. Spee, A. Kuypers
 
Keywords:
 
Thin Film Paste, TCO, CVD
 
Topic:
 
Thin Films
Subtopic: Amorphous and Microcrystalline Silicon
Event: 23rd European Photovoltaic Solar Energy Conference and Exhibition, 1-5 September 2008, Valencia, Spain
Session: 3AV.2.57
 
Pages:
 
2510 - 2512
ISBN: 3-936338-24-8
Paper DOI: 10.4229/23rdEUPVSEC2008-3AV.2.57
 
Price:
 
 
0,00 EUR
 
Document(s): paper
 

Abstract/Summary:


SnO2:F was produced on a moving belt CVD reactor at atmospheric pressure. By careful tuning the process conditions, a highly conductive and transparent layer was formed. One of our best samples is compared to Asahi U-type and shows superior electrical and optical characteristics for Si solar applications. Keywords: TCO, CVD, thin film