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Reduced Surface Reflection of Solar Silicon and Solar Glass by Maskless Plasma Texturing with CHF3/H2
A. Okhorzina, N. Bernhard
Plasma Texturing, Optical Properties, Silicon, Solar Glass
Silicon Materials and Cells
Subtopic: High Temperature Route for Si Cells
Event: 37th European Photovoltaic Solar Energy Conference and Exhibition
Session: 2DV.3.38
545 - 548
ISBN: 3-936338-73-6
Paper DOI: 10.4229/EUPVSEC20202020-2DV.3.38
0,00 EUR
Document(s): paper, poster


The reduction of reflection at the glass surface of a solar module and at the encapsulation polymer to silicon interface in the module leads to an efficiency improvement of the module. Plasma texturing with a CHF3/H2 chemistry was applied to both glass and silicon surfaces to reduce their reflectivity. Spectrally resolved reflection and transmission measurements were performed to measure the effect of the texturing. Complementary SEM pictures were taken for the Si samples, and AFM measurements on the glass surface were performed to verify the texturing. It was shown that the plasma texturing with CHF3/H2 chemistry can reduce the reflectivity of silicon more than the standard wet chemical process used in industry. Also for the glass surface a slight reduction of reflectivity could be achieved.