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Impact of Surface Structures on the Inline Vision Inspection of Antireflection Coatings
A. Krieg, J. Wallach, S. Rein
Anti-Reflection Coating, Manufacturing and Processing, Silicon-Nitride, Inline Inspection, Process Control
Wafer-based Silicon Solar Cells and Materials Technology
Subtopic: Mono- and Multicrystalline Silicon Materials and Cells
Event: 24th European Photovoltaic Solar Energy Conference, 21-25 September 2009, Hamburg, Germany
Session: 2DV.1.14
2041 - 2044
ISBN: 3-936338-25-6
Paper DOI: 10.4229/24thEUPVSEC2009-2DV.1.14
0,00 EUR
Document(s): paper


At present inline measurements of antireflection coating (ARC) thickness are established, but there are still open questions concerning the influence of a varying surface texture quality on accuracy of ARC thickness measurement. Surface texture may be different due to process inhomogeneities. Thus, inline color inspection systems in production lines are often only used to detect inhomogeneities or spots in the ARC in order to sort the cells into different optical quality classes. This work aims at evaluating the possibilities and restrictions to determine the thickness of the ARC with inline vision irrespective of the wafer surface. Special emphasis has been put on textured monocrystalline wafers. Considering the reflection after texturisation the accuracy of ARC thickness measurement by color vision inspection may be improved significantly. Finally, it has been shown that an inline measurement of the reflection after texturisation would be possible with the same inline system and an aligned calibration.