Search documents

Browse topics

Document details

Surface Modification of LPCVD ZnO-Films for Silicon Thin Film Solar Cells
F. Lükermann, V. Mönkemöller, H. Kurz, M. Sacher, F. Hamelmann, H. Stiebig, U. Heinzmann
Light Trapping, Transparent Conducting Oxides (TCO), Plasma Etching
Thin Films Solar Cells
Subtopic: Amorphous and Microcrystalline Silicon Solar Cells
Event: 24th European Photovoltaic Solar Energy Conference, 21-25 September 2009, Hamburg, Germany
Session: 3BO.9.4
2299 - 2303
ISBN: 3-936338-25-6
Paper DOI: 10.4229/24thEUPVSEC2009-3BO.9.4
0,00 EUR
Document(s): paper


The influence of the surface morphology of the front contact layer on the properties of amorphous silicon based solar cells is presented. Based on a textured LPCVD substrate, which consists of pyramidal grains emerging out of the surface plane, the surface topology is modified by plasma etching. By varying the gas composition in the plasma at a fixed total flow, we were able to create surface morphologies whose features show deviations from the pyramidal shape, without significantly changing the surface roughness. For the plasma etched samples JSC decreases in comparison to the as-deposited ZnO. The decrease in current is not exclusively caused by a degraded red response but also due to a lowered quantum efficiency in the whole visible spectral range. This is attributed to a degraded light incoupling at the ZnO/ a-Si interface due to the altered pyramidal shape. It could be shown experimentally that the shape of the surface morphology is important for light incoupling as well as light trapping.